Improvement in the Figure of Merit of ITO-Metal-ITO Sandwiched Films on Poly Substrate by High-Power Impulse Magnetron Sputtering
نویسندگان
چکیده
High-power impulse magnetron sputtering (HiPIMS) was used to deposit ITO/Ag/ITO (IAgI) and ITO/Cu/ITO (ICuI) sandwiched films on polyethylene naphthalate substrate at room temperature as flexible transparent conductive materials. The hybrid layers were constructed with 40 nm ITO bottom top layers, a 5–20 Ag or Cu interlayer. microstructure optoelectrical properties estimated for these various thicknesses of the metal Thanks high-power density highly ionized plasma in HiPIMS process, IAgI ICuI sandwich structures exhibited good crystallinity smooth surfaces high optical transmittance low sheet resistance. optimal figure merit obtained 101.16 × 10−3·Ω−1 film 4.83 interlayer thickness 10 nm, both which are higher than that from similar structure reported via temperature. These results indicate is promising technique onto soft substrates applications optoelectronic devices.
منابع مشابه
Deposited Indium Tin Oxide (ito) Thin Films by Dc- Magnetron Sputtering on Polyethylene Terephthalate Substrate (pet)
M.K.M. ALI , K. IBRAHIM , OSAMA S HAMAD , M.H. EISA , M.G. FARAJ , and F. AZHARI 1 School of Physics, University Sains Malaysia, Penang 11800, Malaysia Department of Physics, College of Science, Sudan University of Science and Technology, Khartoum 11113, Sudan School of Electrical and Electronic Engineering, University Sains Malaysia, Penang 11800, Malaysia E-mail: [email protected], kamarul@...
متن کاملHigh power impulse magnetron sputtering discharge
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...
متن کاملOff-normal Film Growth by High Power Impulse Magnetron Sputtering
In this study we contribute towards establishing the process-microstructure relationships in thin films grown off-normally by ionized physical vapor deposition. High power impulse magnetron sputtering (HiPIMS) is used at various peak target powers and deposition rates to grow copper (Cu) and chromium (Cr) films from a cathode placed at an angle 90 degrees with respect to the substrate normal. F...
متن کاملExploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films
Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bomb...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Coatings
سال: 2021
ISSN: ['2079-6412']
DOI: https://doi.org/10.3390/coatings11020144